矽基鍺材料應變調制於光調變器及其光耦合技術研究 1050801~1060731
[電子迴旋共振化學氣相沉積法,磊晶成長鍺於矽之虛擬基板,單石積體化,磊晶矽鍺,應 力調變,光學調制器
,
Electron cyclotron chemical vapor deposition (ECRCVD), Ge on Si substrate, Ge epitaxy, Stress tuning, Optical modulator]
矽基鍺材料應變調制於光調變器及其光耦合技術研究 1040801~1050731
[電子迴旋共振化學氣相沉積法,磊晶成長鍺於矽之虛擬基板,單石積體化,磊晶矽鍺,應 力調變,光學調制器
,
Electron cyclotron chemical vapor deposition (ECRCVD), Ge on Si substrate, Ge epitaxy, Stress tuning, Optical modulator]
